AR Runway
Ramiro Albán presents TCS // ORIGIN. Art-printed garments walk twice, once in fabric, once in light. Models walk the physical runway; raise your phone and each look reveals its digital layer, animated graphics living on the garments themselves. The printed design is the tracking marker, so what you see in AR tonight is exactly what the merch unlocks at home.
Designed by Ramiro Albán, who showed at New York Fashion Week (FDLA, February 2024); his AR fashion show in Doha was covered by Euronews.



